Cleaning liquid for semiconductor devices

摘要

A cleaning liquid for semiconductor devices comprising 0.1 to 10% by weight of a fluorine compound, 72 to 80% by weight of an organic solvent soluble in water, and the remaining amount of water. The cleaning liquid can remove resist residues left remaining after dry etching and ashing in the wiring step in the production of semiconductor integrated circuits rapidly and completely at a low temperature and does not corrode wiring materials. <IMAGE>