发明名称 Chemi-mechanical polishing machine and its retaining sleeve for manufacture of semiconductors
摘要 The polishing machine retaining sleeve (50) has a set of suspension passages (52) in its lower part and a circular track (54). By circulating the suspension through the suspension passages and the circular track a semiconductor section is leveled with excellent uniformity in the polishing machine.
申请公布号 FR2767735(A1) 申请公布日期 1999.03.05
申请号 FR19980010824 申请日期 1998.08.28
申请人 UNITED MICROELECTRONICS CORPORATION 发明人 LIN JUEN KUEN;LAI CHIEN HSIN;PENG PENG YIH;WU KUN LIN;CHIU DANIEL;YANG CHIH CHIANG;WU JUAN YUAN;CHIU HAO KUANG
分类号 B24B37/04;B24B57/02 主分类号 B24B37/04
代理机构 代理人
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