发明名称 |
Chemi-mechanical polishing machine and its retaining sleeve for manufacture of semiconductors |
摘要 |
The polishing machine retaining sleeve (50) has a set of suspension passages (52) in its lower part and a circular track (54). By circulating the suspension through the suspension passages and the circular track a semiconductor section is leveled with excellent uniformity in the polishing machine. |
申请公布号 |
FR2767735(A1) |
申请公布日期 |
1999.03.05 |
申请号 |
FR19980010824 |
申请日期 |
1998.08.28 |
申请人 |
UNITED MICROELECTRONICS CORPORATION |
发明人 |
LIN JUEN KUEN;LAI CHIEN HSIN;PENG PENG YIH;WU KUN LIN;CHIU DANIEL;YANG CHIH CHIANG;WU JUAN YUAN;CHIU HAO KUANG |
分类号 |
B24B37/04;B24B57/02 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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