发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition capable of effectively responsing to various kinds of radiations and forming a pattern high in resolution and responsing to many uses by incorporating a copolymer having specified repeating units and solubilizable in alkali by an acid and a radiation- sensitive acid generator. SOLUTION: This composition contains the radiation-sensitive acid generator and the copolymer solubilizable in alkali by an acid and having 3 kinds of repeating units each represented by formulae I-III in which each of R<1> -R<3> is an II atom or a methyl group; and R<4> is a >=7 C univalent alicyclic group, preferably, having 7-15 C. The content of the repeating units of formula I and that of the repeating units of formula II and that of the repeating units of formula III in the total repeating units are usually 10-75 mol.% and usually 10-70 mol.% and usually 5-50 mol.%, respectively.
申请公布号 JPH1165120(A) 申请公布日期 1999.03.05
申请号 JP19970233255 申请日期 1997.08.15
申请人 JSR CORP 发明人 IKEMURA TOSHIAKI;KOBAYASHI HIDEKAZU;TANABE TAKAYOSHI;IWANAGA SHINICHIRO
分类号 G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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