Ellipsometer-Meßvorrichtung

摘要

The invention relates to an ellipsometer measuring instrument for determining the thickness of a film deposited on a substrate. Said ellipsometer comprises: a light source (3) which emits an entrance ray (9); a transmitting optical system which guides the entrance ray (9) to a point of incidence (P) on the substrate; and a receiving optical system with an analyzer (5.4) which guides the reflection ray (10) formed at the point of incidence (P) to a photoreceptor device (5.7). The polarizing directions of the entrance ray (9) and of the analyzer (5.4) are modified in time in relation to each other, and the intensity modifications thus generated are evaluated by an evaluation device (7) in order to determine the thickness of the film. The inventive measuring instrument is characterized by its ease of operation and its precision in measuring film thickness, even for objects which are not easily accessible and are differently curved. To this end, the ellipsometer has an angle-measuring device (5.7) for detecting the angle ( beta ) of the reflection ray (10) in relation to a tangential plane of the substrate at the point of incidence (P). The film thickness can then be determined in accordance with the angle ( beta ) detected by means of the evaluation device (7).