发明名称 |
Process for producing a structured mask |
摘要 |
PCT No. PCT/AT95/00111 Sec. 371 Date Nov. 25, 1997 Sec. 102(e) Date Nov. 25, 1997 PCT Filed May 30, 1995 PCT Pub. No. WO96/38763 PCT Pub. Date Dec. 5, 1996A process is disclosed for producing a structured mask for use in reproducing structures of that mask on an object with the aid of electromagnetic or particulate radiation, in particular for ion beam lithography. A flat smooth substrate of more than 20 mu m in thickness is selected and a thin diaphragm is produced from that substrate by etching one of the sections removed from the edging to a depth of c. 0.5-20 mu m, the tensile stress within the diaphragm being greater than 5 MPa. Lithographic structures are then formed on a central region of the diaphragm with a tensile stress of more than 5 MPa; apertures are etched into the diaphragm to form the mask structures and the effective thickness inside a diaphragm region substantially enclosing the mask structures is reduced, causing the central region containing the structures to be joined to the substrate edging elastically in such a way that the mean tensile stress within this central region is reduced to below 5 MPa. The region with reduced effective thickness preferably takes the form of a peripheral channel or at least one perforation.
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申请公布号 |
US5876880(A) |
申请公布日期 |
1999.03.02 |
申请号 |
US19970930065 |
申请日期 |
1997.11.25 |
申请人 |
IMS IONEN MIKROFABRIKATIONS SYSTEME GELLSCHAFT M.B.H. |
发明人 |
VONACH, HERBERT;CHALUPKA, ALFRED;LOESCHNER, HANS |
分类号 |
G03F1/16;G03F1/20;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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