发明名称 |
APPARATUS AND METHOD FOR IN-SITU THICKNESS AND STOAPPARATUS AND METHOD FOR IN-SITU THICKNESS AND STOICHIOMETRYMEASUREMENT OF THIN FILMS ICHIOMETRYMEASUREMENT OF THIN FILMS |
摘要 |
An apparatus and method for using .alpha.-particle energy loss to measure the thickness and stoichiometry of films grown by molecular beam epitaxy and other methods. The apparatus for measuring the thickness of films grown on a substrate in a growth chamber, comprises a protective housing having an aperture opening into the growth chamber, a solid state detector disposed in the protective housing, a shutter for opening and closing the aperture, a shield disposed in the housing between the aperture and the solid state detector for shielding the detector, and a calibration source disposed between the shield and the detector for calibrating the measurements made by the detector. A second calibration source disposed between the shutter and the shield, for measuring deposition on the shield.
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申请公布号 |
CA2300166(A1) |
申请公布日期 |
1999.02.25 |
申请号 |
CA19982300166 |
申请日期 |
1998.08.19 |
申请人 |
THE UNIVERSITY OF ALBERTA, SIMON FRASER UNIVERSITY, THE UNIVERSITY OF VI CTORIA, AND THE UNIVERSITY OF BRITISH COLUMBIA, DOING BUSINESS AS TRIUMF |
发明人 |
KELSON, ITZHAK;LEVY, YUVAL |
分类号 |
C23C14/52;C30B23/02;G01B15/02;G01N23/06;G01N23/221;(IPC1-7):G01B15/02 |
主分类号 |
C23C14/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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