发明名称 |
Method for depositing aluminum layers on insulating oxide substrates |
摘要 |
<p>A manufacturing method which includes forming a metallic, aluminum-containing layer (10) adherent to a surface of a body (20). The method includes the steps of depositing aluminum on the surface from an aluminum-containing vapor, and during the aluminum-depositing step, the further step of depositing arsenic, phosphorus, or antimony on the surface from the vapor. <IMAGE></p> |
申请公布号 |
EP0604036(B1) |
申请公布日期 |
1999.02.24 |
申请号 |
EP19930309630 |
申请日期 |
1993.12.02 |
申请人 |
AT&T CORP. |
发明人 |
CUNNINGHAM, JOHN EDWARD;JAN, WILLIAM YOUNG;RENTSCHLER, JOHN ANDERSON;WARWICK, COLIN ALAN |
分类号 |
C23C14/06;H01L21/203;H01L21/3205;H01L21/768;H01L23/532;(IPC1-7):H01L21/768;H01L21/320;H01L23/485 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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