IMMUNITY SUPPRESSION BY PHOTOCHEMOTHERAPY

摘要

Immunosuppressive compositions for photochemotherapy which contain as the active ingredient tetrapyrrole derivatives represented by general formula (I) or pharmacologically acceptable salts thereof wherein n is 1 or 2. Administration of the derivatives of general formula (I) or salts thereof as immunosuppressive agents in photochemotherapy makes it possible to prevent or treat abnormally supernumerary immune responses, for example, contact hypersensitivity or implant rejection reactions.