| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an atmospheric pressure CVD equipment which is capable of preventing the generation of dust, and to avoid falling of a wafer pallet. SOLUTION: A silicon wafer is placed on a wafer pallet 4 which is fixedly fitted between a pair of slide blocks 20, 20 and a pair of tap plates 21, 21 which are, respectively, arranged in face-to-face relation. The silicon wafer is conveyed to a reactive gas ejection system, by permitting the slide blocks 20, 20 to be moved in accordance with rotation of a pair of two-row endless conveyor chains 15, 15. Then, temperature is raised by means of hot plates each provided inside the conveyor chains 15, 15 to form a film on the silicon wafer. A bridge 30 is provided between the pair of slide blocks 20, 20 to keep the distance therebetween and to connect the blocks 20, 20 with each other.</p> |
