| 摘要 |
PROBLEM TO BE SOLVED: To provide the negative resist composition and the method for forming the negative resist image high in active radiations, such as ultraviolet and far ultraviolet and X rays and electron beams and superior in resolution. SOLUTION: This resist composition contains a resin soluble in an aqueous solution of alkali and an amino resin, and a phenol compound having a haloacetyl group as an acid generator, and the negative resist image is formed by coating a substrate with this composition, drying it, irradiating it with the active radiation, heating it, and developing it with an aqueous solution of alkali. |
