| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist compsn. capable of being exposured with an ArF excimer laser and forming a stable and excellent pattern by incorporating a specified polymer compd. and a compd. which produces acid by irradiation of ionizing radiation. SOLUTION: The resist compsn. contains a polymer compd. containing a group having a oxycarbonyl structure expressed by the formula which leaves by the reaction with an acid, and a compd. which produces an acid by exposure to ionization radiation. In the formula, p is 0 or 1, R<1> , R<2> are independently 1-7C aliphatic hydrocarbon groups or 1-7C aliphatic hydrocarbon groups substituted with alkoxy groups, silyl groups, etc., R<3> , R<4> are independently hydrogen atoms, 1-7C aliphatic hydrocarbon groups, alkoxycarbonyl groups, or 1-7C aliphatic hydrocarbon groups substituted with polar groups such as halogen atoms. The polymer compd. used is a resin insoluble with an alkali developer. As for the compd. which produces an acid by exposure to ionization radiation, an onium salt is used. |
