发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PROBLEM TO BE SOLVED: To prevent reduced short-circuit between a diebond material and an electrode by providing a conductive part where such electric potential as higher than that of a diebond material is applied on a chip. SOLUTION: Between a conductive diebond material 8 which contains Ag an electrode 3 where such electric potential as lower than the diebond material 8 is applied, such electrode region 6 as Au plating is formed so as to enclose the electrode 3. Application of such electric potential as higher than the diebond material 8 causes Ag ion in the diebond material to be attracted to the electrode 3 for moving, so that the migration phenomenon of Ag is prevented, thus the short-circuit between the diebond material 8 and the electrode 3 is prevented from occurring. In short, since the metal plating region 6 where such electric potential as higher than the diebond material is applied is formed between the diebond material 8 and the electrode 3, an electric field in the direction opposite to that between the diebond material 8 and the electrode 3 occurs. As a result, movement of the Ag ion which is positive ion I prevented, and the occurrence of a short-circuit caused by formation of a linear metal Ag between the diebond material 8 and the electrode 3 is prevented.
申请公布号 JPH1126479(A) 申请公布日期 1999.01.29
申请号 JP19970182180 申请日期 1997.07.08
申请人 MITSUBISHI ELECTRIC CORP 发明人 UMEMOTO TETSUYA
分类号 H01L21/52;(IPC1-7):H01L21/52 主分类号 H01L21/52
代理机构 代理人
主权项
地址