| 摘要 |
PROBLEM TO BE SOLVED: To decide whether or not a processing dimension reaches its desired value only by observing without making measurement, in the etching processing of a semiconductor substrate. SOLUTION: In a mask 11 for etching the surface of this substrate, a pattern 2 is formed for monitoring its processing-dimension. Hereupon, the pattern 2 comprises two square patterns with lengths of L1 , L2 the space wherebetween being twice as long as that of side etching. Further, in the two square patterns, the foregoing lengths L1 , L2 of the two sides adjacent to each other are made different from each other. |
