发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain the positive radiation sensitivity resin composition especially excellent in sensitivity and improved in resolution and focus latitude and the like and useful as resist by using an alkali-soluble resin obtained by polycondensing phenol and at least one kind of xylenol with an aldehyde compound. SOLUTION: The radiation sensitive resin composition contains a quinonediazido compound and the alkali-soluble resin obtained by polycondensing the phenol and at least one kind of xylenol with an aldehyde compound. As the xylenol, 3,5-xylenol and 2,3-xylenol and the like are enumerated, and a preferable combination of phenol and xylenol is embodied by phenol and 2,3- xylenol, and as the aldehyde compound, formaldehyde and trioxane and the like, and it is used in an amount of 0.5-2.0 mol per 1 mol of the phenolic compounds.
申请公布号 JPH1124253(A) 申请公布日期 1999.01.29
申请号 JP19970189023 申请日期 1997.06.30
申请人 JSR CORP 发明人 DOUKI KATSUJI;SUWA MITSUFUMI;MIZUMACHI TORU;IWANAGA SHINICHIRO
分类号 G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/023 主分类号 G03F7/022
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