发明名称 METHOD FOR FABRICATING THIN FILMS OF BARIUM STRONTIUM TITANATE
摘要 <p>A liquid precursor containing barium, strontium, and titanium, is applied to a first electrode (28, 55), dried in air at a first temperature of 160 °C and then a second temperature of 400 °C, and annealed at a temperature of 800 °C in nitrogen to form a thin film (30, 60) of barium strontium titanate. A second electrode (32, 77) is deposited and the device (10, 70) is patterned to form a capacitor (16, 72), and a second anneal is performed at a temperature of 800 °C in nitrogen. In this manner, a high electronic quality thin film (30, 60) of barium strontium titanate is fabricated without a high-temperature oxygen anneal.</p>
申请公布号 WO1999004421(A1) 申请公布日期 1999.01.28
申请号 US1998014881 申请日期 1998.07.17
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址