发明名称 NONVOLATILE SEMICONDUCTOR MEMORY AND MANUFACTURE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To hold the conventional floating gate potential with a low control gate potential by comprising aux. control gates (first gate electrodes) in addition to floating gates (second gate electrodes) and control gates (third gate electrodes). SOLUTION: At erasing, a control gate electrode voltage VCG1 and aux. control gate electrode voltage VCG2 are set to 0 V and substrate voltage Vsub to an erase potential VPPe to enable the erase. At writing, the control gate electrode voltage VCG1 and aux. control gate electrode voltage VCG2 of a selected memory cell are set to a write potential VPPW, the substrate voltage Vsub to 0 V, and the control gate of a not selected memory cell is set to 0 V or bit line medium potential VMWL to enable the write. This allows the applied voltage at erasing to lower and hence the peripheral circuits and chip area to be reduced.</p>
申请公布号 JPH1126620(A) 申请公布日期 1999.01.29
申请号 JP19980075343 申请日期 1998.03.24
申请人 TOSHIBA CORP 发明人 ARAKI HITOSHI;HATAKEYAMA KAZUO
分类号 G11C16/04;H01L21/8247;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 G11C16/04
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