| 摘要 |
PROBLEM TO BE SOLVED: To form a fine pattern of higher aspect ratio by preventing a resist pattern from breaking due to surface tension when a rinse liquid is dried. SOLUTION: The device is so configured as to develop a pattern on a substrate 2. Here, with heating mechanisms 18 and 24 provided, one or more of the substrate 2, a final rinse liquid, and a dry air, are heated for processing the method, a process is provided where, when the final rinse liquid 13 or the dry air is supplied to the substrate 2, the temperature of one or more of the substrate 2, the final rinse liquid 13, and the air for drying, are made higher than that of the substrate 2 and a solvent used in the process before the final rinse liquid 13 is supplied. |
