发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE BY USING THE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain the composition high in sensitivity and superior in printing resistance and resistance to chemicals by incorporating an acidic vinyl copolymer soluble or swellable in aqueous alkali obtained by copolymerization of specified monomers. SOLUTION: The photoconductive composition contains the acidic vinyl copolymer soluble or swellable in aqueous alkali obtained by copolymerization of at least a monomer represented by formula I and a monomer represented by formula II and an unsaturated carboxylic acid. In formulae I and II, each of R1 -R3 is, independently, an H atom or a methyl group; each of R<4> -R<6> is, independently, an H or halogen atom or an alkyl, alkoxy, or aryl group; R<7> is an H or a methyl group; R<8> is an H or halogen atom or an alkyl, alkoxy, or aryl group; and Z is a divalent bonding group having at least 3 nonmetallic atomic groups in the main chain.
申请公布号 JPH1115153(A) 申请公布日期 1999.01.22
申请号 JP19970171821 申请日期 1997.06.27
申请人 MITSUBISHI CHEM CORP 发明人 TSUJI SHIGEO
分类号 G03F7/021;C08F220/40;C08F290/12;C09D4/06;C09D133/14;G03F7/00;G03F7/027;G03F7/033;G03F7/038;(IPC1-7):G03F7/033 主分类号 G03F7/021
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