| 摘要 |
<p>A multiple point scanning system is suitable for determining the orientation in space of a substrate such as a flat panel display or semiconductor wafer. The system includes a scanning end effector (100, 102) which may be utilized with an end effector structure, the end effector structure having a first end and a second end, the first end including a forward scanning sensor (FS) and the second end including top scanning sensors (TS). The system may also include a rear scanning sensor (424) coupled to a sensor frame (450). In yet another embodiment of the present invention, three sensors are located in a front end setup at three different locations in an X-Y plane, to sense the Z-axis coordinates of a substrate or wafer in a front end processor which is positionable on an elevator.</p> |
