发明名称 SIMULTANEOUSLY BOTH-SIDED POLISHING METHOD
摘要 PROBLEM TO BE SOLVED: To keep and improve the flatness, surface roughness, appearance and dimensional accuracy of polishing by reversing the rotating direction of a carrier after the end of polishing designated number of times. SOLUTION: In case of seeing a simultaneously both-sided polishing machine from above, a sun gear 3, an internal gear 4 and a lower lapping machine 5 are all rotated counterclockwise, an upper lapping machine is rotated clockwise, and a carrier 2 is revolved round the sun gear 3 counterclockwise. The rotating direction of the carrier 2 is reversed every time working is performed five times. Concerning the cycle of reversion in the rotating direction of the carrier, it is suitable that the number of times of conducting a polishing process is within 10 times, and preferably it is within 5 times. Thus, the rotating direction of the carrier 2 is reversed every time polishing is performed a designated number of times, whereby the flatness and surface roughness of a product can be kept and improved. Further a magnetic head can be decreased in floating amount, so that the magnetic disc can be densificated and especially the line recording density can be improved.
申请公布号 JPH1110528(A) 申请公布日期 1999.01.19
申请号 JP19970161338 申请日期 1997.06.18
申请人 NIKON CORP;SAGAMI OPT:KK 发明人 YOSHINO KUNIHIKO;KONDO MASAO
分类号 B24B37/08;G11B5/84 主分类号 B24B37/08
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