发明名称 CARRIER FOR BOTH-SIDED POLISHING
摘要 PROBLEM TO BE SOLVED: To eliminate the need of considering variation in the dressing frequency in manufacturing abrasive cloth and also reduce variation in working accuracy of a material to be polished to the minium by providing a carrier with a dressing function to the abrasive cloth. SOLUTION: A carrier 10 is formed like a disc in such a manner that three sets of polished material holding holes 11, 11, 11 and abrasive material supply holes 12, 12, 12 are provided in the respective symmetrical positions of the interior, an outer peripheral tooth is provided on the outer periphery, and the structural member is formed by a metal or resin coated metal or resin member. A ring 13 formed by a resin-coated metal or resin member is provided in the outer peripheral region of an area of the carrier 10 where the polished material holding holes 11 and the abrasive material supply holes 12 exist. Thus, the mechanical rigidity of the carrier can be ensured structurally, and further the flatness correcting function to the upper and lower abrasive cloth is formed by the projecting parts provided on both upper and lower surfaces of the ring 13. The stable polishing accuracy for a material to be polished can be ensured.
申请公布号 JPH1110530(A) 申请公布日期 1999.01.19
申请号 JP19970184405 申请日期 1997.06.25
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 MASUMURA HISASHI;SUZUKI KIYOSHI
分类号 B24B37/27;B24B37/28;B24B53/00 主分类号 B24B37/27
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