发明名称 Microwave plasma processing apparatus and method
摘要 The present invention relates to a microwave plasma processing apparatus, suited for generating a plasma by using microwaves, and a processing method. Microwaves propagated through a circular waveguide are tuned in the space thereof by a microwave tuner that is installed to match the impedance, and are introduced in a uniform and most efficient state into a discharge block having a plasma-resistant inner surface that is enlarged in a tapered form through a microwave introduction window. Then, a processing gas controlled to a predetermined pressure by a gas supplying structure and gas evacuating structure is turned into a plasma which is more uniform and is more dense by interaction of a microwave electric field that is efficiently introduced and a magnetic field produced by a solenoid coil.
申请公布号 US5861601(A) 申请公布日期 1999.01.19
申请号 US19940340337 申请日期 1994.11.14
申请人 HITACHI, LTD. 发明人 SATO, YOSHIAKI;KATAMOTO, MITSURU;KAWAHARA, HIRONOBU;SORAOKA, MINORU;UMEMOTO, TSUYOSHI;KIHARA, HIDEKI;KUDO, KATSUYOSHI;YUKIMASA, TOORU;KAKUTANI, HIROFUMI
分类号 H05H1/46;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):B23K10/00 主分类号 H05H1/46
代理机构 代理人
主权项
地址