发明名称 |
Microwave plasma processing apparatus and method |
摘要 |
The present invention relates to a microwave plasma processing apparatus, suited for generating a plasma by using microwaves, and a processing method. Microwaves propagated through a circular waveguide are tuned in the space thereof by a microwave tuner that is installed to match the impedance, and are introduced in a uniform and most efficient state into a discharge block having a plasma-resistant inner surface that is enlarged in a tapered form through a microwave introduction window. Then, a processing gas controlled to a predetermined pressure by a gas supplying structure and gas evacuating structure is turned into a plasma which is more uniform and is more dense by interaction of a microwave electric field that is efficiently introduced and a magnetic field produced by a solenoid coil.
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申请公布号 |
US5861601(A) |
申请公布日期 |
1999.01.19 |
申请号 |
US19940340337 |
申请日期 |
1994.11.14 |
申请人 |
HITACHI, LTD. |
发明人 |
SATO, YOSHIAKI;KATAMOTO, MITSURU;KAWAHARA, HIRONOBU;SORAOKA, MINORU;UMEMOTO, TSUYOSHI;KIHARA, HIDEKI;KUDO, KATSUYOSHI;YUKIMASA, TOORU;KAKUTANI, HIROFUMI |
分类号 |
H05H1/46;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):B23K10/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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