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发明名称
NEW ANTISTATIC AGENT AND ITS PHOTO-CURABLE RESIN COMPOSITIONS
摘要
申请公布号
KR0161749(B1)
申请公布日期
1999.01.15
申请号
KR19940024338
申请日期
1994.09.27
申请人
HANWHA CHEMICAL CORPORATION
发明人
LEE, HANG-WOO;HONG, JIN-HWU;KIM, SANG-KEUN;KIM, SUNG-HO;MOON, EUI-SUK;HWANG, KONG-HYUN;CHOE, CHOL-KYU
分类号
C08K5/00;C08L33/08;(IPC1-7):C08K5/00
主分类号
C08K5/00
代理机构
代理人
主权项
地址
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