发明名称 Radio frequency generating systems and methods for forming pulse plasma using gradually pulsed time-modulated radio frequency power
摘要 A radio frequency (RF) generating system for forming pulse plasma utilizes a plasma reaction device comprises a function generator, an amplifier, and an input port. The function generator generates a signal of time-modulated RF power according to a modulation function having a waveform, wherein the waveform gradually ascends at a rising edge and gradually descends at a falling edge. The input port receives the signal from the function generator and transmits the signal to the amplifier. The amplifier amplifies the signal to a predetermined level and then transmits the amplified signal to the plasma reaction device. A method for forming pulse plasma comprises the steps of generating a time-modulated RF power signal according to a modulation function having a waveform, wherein the waveform is shaped to gradually ascend at a rising edge and to gradually descend at a falling edge, amplifying the time-modulated RF power signal to a predetermined level, and transmitting the amplified time-modulated RF power signal to a plasma reaction device. In an embodiment of the present invention, the waveform is a half sine waveform, though other suitable waveforms include a half cosine waveform and a Gaussian pulse signal.
申请公布号 US5859501(A) 申请公布日期 1999.01.12
申请号 US19970818256 申请日期 1997.03.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHI, KYEONG-KOO
分类号 C23F4/00;H01L21/302;H01L21/3065;H03B28/00;H05H1/46;(IPC1-7):H05H1/46 主分类号 C23F4/00
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