发明名称 |
Method for fabricating grating coupler |
摘要 |
A grating coupler is formed by growing an optical waveguide layer on a substrate by an epitaxial growing process such as a metalorganic chemical vapor deposition and a molecular beam deposition. The optical waveguide layer has a surface on which a cross-hatch pattern serving as the grating is continuously formed. The optical waveguide layer is formed with a material having a reflective index greater than a reflective index of the substrate or an atmosphere. Specifically, the substrate is formed with GaAs and the optical waveguide layer is formed with InGaAs. Further, the substrate is an on-substrate having an orientation coinciding with a [100] plane, so as to form the optical waveguide layer having continuous cross-hatch patterns on the surface thereof. The spacing between the cross-hatch patterns can be varied according to variation of a growth temperature of the optical waveguide layer.
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申请公布号 |
US5855669(A) |
申请公布日期 |
1999.01.05 |
申请号 |
US19970842872 |
申请日期 |
1997.04.17 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
BAEK, JONG-HYEOB;LEE, BUN |
分类号 |
G02B6/293;C30B25/02;G02B5/18;G02B6/122;G02B6/124;G02B6/34;H01L21/203;(IPC1-7):C30B25/16 |
主分类号 |
G02B6/293 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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