发明名称 GAAS FIELD-EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce a pulse delay phenomenon by a method wherein an electronic trap amount in a GaAs oxide film on a GaAs active layer coming into contact with a depletion layer spreading from a gate electrode is reduced, and pulse characteristics of an output signal for a pulse signal are set more than characteristics. SOLUTION: GaAs active layers 7 are laminated on a GaAs semi-insulation substrate 8, and a source/drain electrode 4 is provided on the GaAs active layer 7, and a gate electrode 1 is arranged on the GaAs active layer 7 between the source and drain electrodes 4. When movements of electrons between the source and drain electrodes 4 are controlled according to a pulse signal input into the gate electrode 1, an electronic trap amount in a GaAs oxide film on the GaAs active layer 7 coming into contact with a depletion layer 9 spreading from the gate electrode 1 is reduced, and pulse characteristics of an output signal for a pulse signal are set more than 80%. Thereby, a delay of the pulse characteristics is prevented.
申请公布号 JPH10335352(A) 申请公布日期 1998.12.18
申请号 JP19970158024 申请日期 1997.05.29
申请人 MITSUBISHI ELECTRIC CORP 发明人 KUDO SHOKICHI
分类号 G03F7/42;H01L21/027;H01L21/338;H01L29/812;(IPC1-7):H01L21/338 主分类号 G03F7/42
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