CHEMICAL ETCHANT FOR PALLADIUM

摘要

A cyanide based aqueous solution for stripping palladium from copper-containing substrate. The solution includes a cyanide radical source comp ound, Na2CO3, a nitrobenzoic acid, NaOH, thallium compound, an organo mercapto compound, and water. The presence of the organo mercapto compound in thallium containing cyanide bath permits efficient stripping of palladium from copper containing substrates with minimum corrosion damage to the substrate.