发明名称 SUBSTRATE TREATMENT METHOD AND ITS EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To facilitate smoothly opening the lid body of a substrate cassette, when the inside of a closed type substrate cassette wherein a substrate accommodating space has an atmospheric pressure is opened in a carrying-in chamber in a positive pressure atmosphere, by turning the inside of the carrying-in chamber into a positive pressure atmosphere of inert gas, by reopening supply of the inert gas. SOLUTION: The inside of a cassette 3 is maintained in the state of an atmospheric pressure or nearly equal to the state. when a cassette 3 is set on a cassette mounting part 4, a signal A1 is outputted to a controller C. On the basis of the signal A1, a shutting command signal B1 is outputted to an on-off valve V1, and supply of nitrogen gas to a loading area S2 is stopped. A door 60 and a lid body 32 are opened to a lid body open-shut part 6. When the supply of nitrogen gas is stopped, the pressure in the loading area S2 decreases down to about atmospheric pressure. In the lid body open-shut part 6, the lid body 32 is removed, and a signal A2 is outputted to the controller C. As a result, an opening command signal B3 is outputted to the on-off valve V1, and the supply of nitrogen gas to the loading area S2 is again performed.
申请公布号 JPH10321698(A) 申请公布日期 1998.12.04
申请号 JP19970148650 申请日期 1997.05.21
申请人 TOKYO ELECTRON LTD 发明人 TANIGAWA OSAMU
分类号 H01L21/677;H01L21/205;H01L21/22;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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