| 摘要 |
<p>A plurality of images (3) are produced on a substrate (4) by passing a beam of collimated light through two or more spaced apart apertures (5) in a mask (1) and through a multi lens array (6) onto the substrate (4). The pitch of the multi lens array (6) is substantially equal to the spacing (P 1 ) between the mask apertures (5) so that the distance (P 2 ) between the images (3) produced on the substrate (4) is substantially equal to the mask aperture spacing (P 1 ).</p> |
