FABRICATING METHOD OF GATE USING THERMAL OXIDATION,申请号KR19900020944-传众专利搜索

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发明名称	FABRICATING METHOD OF GATE USING THERMAL OXIDATION
摘要
申请公布号	KR0161839(B1)	申请公布日期	1998.12.01
申请号	KR19900020944	申请日期	1990.12.18
申请人	LG SEMICONDUCTOR CO.,LTD	发明人	SEO, HYUN-HWAN
分类号	H01L27/085;H01L29/772;(IPC1-7):H01L27/085	主分类号	H01L27/085
代理机构		代理人
主权项
地址

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