| 摘要 |
PROBLEM TO BE SOLVED: To provide a phosphor pattern production method by which a phosphor pattern with a uniform film thickness and sufficient tolerances is formed in the whole surface areas in recessed parts of a substrate having roughened surface such as a substrate for PDP, to provide a phosphor pattern with high precision, a uniform shape, and excellent brightness, and to provide a back plate for a plasma display panel comprising the phosphor pattern with high precision, a uniform shape, and excellent brightness. SOLUTION: This method for producing a phosphor pattern includes processes of forming a photosensitive resin composition layer 5 containing (A) phosphor on a surface-roughened substrate 1, radiating scattered light rays in a pattern to the (A) phosphor-containing photosensitive resin composition layer 5, selectively removing the (A) phosphor-containing photosensitive resin composition layer to which scattered light rays are radiated in a pattern by development to form a pattern, the removing unnecessary part are removed from the pattern by firing to form a phosphor pattern. A phosphor pattern produced by such a phosphor pattern 13 producing method is provided and also a back plate for a plasma display panel provided with such a phosphor pattern formed on a substrate for a plasma display panel is also provided. |
