发明名称 ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide an electrostatic chuck capable of easily taking a measure against corrosion of a surface. SOLUTION: An electrostatic chuck 26 is fixed on a pedestal 22 in a treating chamber of an etching equipment or the like. The electrostatic chuck 26 is provided with a base 28 composed of dielectric ceramic, an electrode 38 which is arranged on the base 28 with a given pattern, and a surface layer 40 composed of dielectric ceramic which is arranged on the base 28 so as to cover the electrode 38. The base 28 and the surface layer 40 are bonded with adhesive agent in such a manner that exfoliation is possible. By the above structure, only the surface layer 40 of the electrostatic chuck 26 can be quickly exchanged.</p>
申请公布号 JPH10303286(A) 申请公布日期 1998.11.13
申请号 JP19970096125 申请日期 1997.04.14
申请人 APPLIED MATERIALS INC;KOBE STEEL LTD;SHINKO KOBELCO TOOL KK 发明人 KUMAGAI HIROMI;ARAI IZUMI;IKEDA TSUGUMOTO;SUGIYAMA NARIMASA
分类号 B23Q3/15;H01L21/302;H01L21/3065;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68;H01L21/306 主分类号 B23Q3/15
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