发明名称 |
Planar silicon head with structure protected against over current and voltage |
摘要 |
The planar silicon head has a yoke (104) formed on a silicon substrate (102). The yoke has a gap for reading and writing data. A hole (122,124) formed in the silicon substrate contains a conducting layer. An inner connecting piece (130,132) is formed at one end of the hole. A raised section (126,128) formed at the other end of the hole is used to form an electrode containing a conducting polymer layer which has the property that it changes into an insulator when exposed to an overcurrent or overvoltage.
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申请公布号 |
DE19812111(A1) |
申请公布日期 |
1998.11.12 |
申请号 |
DE19981012111 |
申请日期 |
1998.03.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD., SUWON-CITY, KYUNGKI-DO, KR |
发明人 |
YOON, WOO-YOUNG, GUMI, KR |
分类号 |
G11B5/31;G11B5/40;(IPC1-7):G11B5/40;H01L23/62 |
主分类号 |
G11B5/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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