发明名称 Planar silicon head with structure protected against over current and voltage
摘要 The planar silicon head has a yoke (104) formed on a silicon substrate (102). The yoke has a gap for reading and writing data. A hole (122,124) formed in the silicon substrate contains a conducting layer. An inner connecting piece (130,132) is formed at one end of the hole. A raised section (126,128) formed at the other end of the hole is used to form an electrode containing a conducting polymer layer which has the property that it changes into an insulator when exposed to an overcurrent or overvoltage.
申请公布号 DE19812111(A1) 申请公布日期 1998.11.12
申请号 DE19981012111 申请日期 1998.03.19
申请人 SAMSUNG ELECTRONICS CO., LTD., SUWON-CITY, KYUNGKI-DO, KR 发明人 YOON, WOO-YOUNG, GUMI, KR
分类号 G11B5/31;G11B5/40;(IPC1-7):G11B5/40;H01L23/62 主分类号 G11B5/31
代理机构 代理人
主权项
地址