发明名称 Zinc oxide piezoelectric crystal film on sapphire plane
摘要 <p>When a zinc oxide piezoelectric crystal film is epitaxially grown on an R-plane sapphire substrate by sputtering, a target containing not more than 4.5 percent by weight of Cu with respect to the total content of Zn and Cu is employed so that the zinc oxide piezoelectric film contains Cu. Thus, it is possible to obtain a zinc oxide piezoelectric crystal film having excellent orientation. <IMAGE></p>
申请公布号 EP0638999(B1) 申请公布日期 1998.11.11
申请号 EP19940112041 申请日期 1994.08.02
申请人 MURATA MANUFACTURING CO., LTD. 发明人 KOIKE, JUN;IEKI, HIDEHARU
分类号 H01L41/18;H03H3/08;H03H9/02;H03H9/25;(IPC1-7):H03H9/02 主分类号 H01L41/18
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