发明名称 |
Frame-supported dustproof pellicle for photolithographic photomask |
摘要 |
Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is partly subjected to smoothing treatment. The inventive frame-supported pellicle can solve the heretofore unavoidable problems of dust particle deposition on the photomask even under dustproof protection with a pellicle as well as the high cost of the preparation of the pellicle and the difficulty of finding of any dust particles deposited on the surface of the frame. |
申请公布号 |
US5834143(A) |
申请公布日期 |
1998.11.10 |
申请号 |
US19960754777 |
申请日期 |
1996.11.21 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MATSUOKA, TAKASHI;KUBOTA, YOSHIHIRO;KASHIDA, MEGURU |
分类号 |
G03F1/14;G03F1/64;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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