发明名称 Process and assembly to remove impurities from esp. effluent process air
摘要 In a process to remove impurities from a flow of gas, the gases flow pasta surface bearing a colony of micro-organisms growing as a film (11) on a membrane substrate surface (10) which is maintained in a moist condition by a spray or flow of water or fluid containing an aqueous solution of salts. The novelty is that: (a) the flow of gas passes simultaneously over both sides (front and rear) of the same substrate membrane (10); (b) the substrate is a semi-permeable membrane in whole or in part; (c) depending upon the gas impurities, the gas passes first over that part of the surface with no colony of micro-organisms, or with a colony of micro-organisms;(d) the gas pressure is regulated according to the nature of the impurities and their concentration; (e) the substrate material, the gas, and/or the fluid which moistens the substrate surface are heated; (f) the substrate material (11) is exposed to a continuous or semi-continuous supply of a wetting agent; (g) the membrane (10) is selective with respect to given substances; (h) also claimed is a suitable assembly.
申请公布号 DE19729814(C1) 申请公布日期 1998.11.05
申请号 DE19971029814 申请日期 1997.07.11
申请人 UMSICHT INSTITUT FUER UMWELT-, SICHERHEITS- UND ENERGIETECHNIK E.V., 46047 OBERHAUSEN, DE 发明人 ADAMI, CHRISTOPH, 45143 ESSEN, DE;TSCHERNJAEW, JURI, DR., 45891 GELSENKIRCHEN, DE
分类号 B01D53/84;(IPC1-7):B01D53/84;B01D53/22 主分类号 B01D53/84
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