| 摘要 |
PROBLEM TO BE SOLVED: To provide a highly sensitive and sand blast resistant photosensitive composition allowing direct exposure for drawing with a visible ray by containing a specific urethane (meta)acrylate compound, an alkali soluble polymeric compound and a photochemical polymerization component respectively. SOLUTION: A material for use is a visibly exposable sand blast resistant photosensitive composition containing a photochemically polymerized urethane (meta)acrylate compound (a) having at least two (meta)acryloyl groups, an alkali soluble polymeric compound (b) having an acid value between 50 mg/KOH and 250 mg/KOH, and at least one compound selected from a titanosane compound c-1, an acridine compound and a triazine compound as a photochemical polymerization initiator (c). Also, a visibly exposable sand blast resistant dry film 1 has a structure where a base material 2, a sand blast resistant photosensitive resin layer 3 and a protection material layer 4 are stacked in order and integrated with one another. |
