| 摘要 |
PROBLEM TO BE SOLVED: To improve scratch resistance of the body surface of an automobile and the like by introducing a carbon-based gas and a silicon-base gas into a plasma CVD device and producing plasma of these gases to form a diamond- like carbon film on a substrate so that the film is formed with strong adhesion property on a window or body of a car. SOLUTION: A carbon-based gas such as methane and ethylene, and a silicon- based gas such as silane and disilane are introduced into a plasma CVD device, and each gas is changed into plasma to form a diamond-like carbon film on a plastic substrate or a substrate having an org. surface such as a coating material. The film is a diamond-like carbon film with addition of Si, and the carbon atoms in the film has more SP<3> bonds than SP<2> bonds. In the film forming method above described, a higher electric power or bias voltage is applied in the initial stage of the film forming process so that the org. substances on the substrate surface are partially molten (to cause partial melting). Therefore, the org. substances and the coating film are mixed in the joined region. |
