发明名称 MOSFET having a particular SOI structure
摘要 An MOSFET includes a substrate, an active region on the substrate, a first insulating element and a second insulating element located a distance apart from each other on the active region, the first and second insulating elements dividing the active region into a source region, a drain region, and a channel region, the channel region being disposed between the source region and the drain region, a third insulating film over the active region between the first and second insulating films, and a gate electrode over the third insulating film.
申请公布号 US5831308(A) 申请公布日期 1998.11.03
申请号 US19960731468 申请日期 1996.10.15
申请人 LG SEMICON CO., LTD. 发明人 LEE, DONG HOON
分类号 H01L27/088;H01L21/336;H01L21/762;H01L21/8234;H01L21/8238;H01L21/8242;H01L27/092;H01L29/06;H01L29/78;(IPC1-7):H01L27/01;H01L27/12;H01L31/039 主分类号 H01L27/088
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