发明名称 |
P-TYPE GALLIUM NITRIDE COMPOUND SEMICONDUCTOR, MANUFACTURE THEREOF, AND BLUE LIGHT-EMITTING ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To activate a p-type impurity that is added into a gallium nitride compound semiconductor more efficiently, by performing setting so that a larger fixed amount of inert gas than the specific amount of p-type impurity being added into gallium nitride compound semiconductor film can be electrically activated. SOLUTION: A GaN film including a p-type impurity is formed on a sapphire substrate. Then, an annealing treatment is performed to a substrate where the GaN film is formed. A substrate 30 is installed at the center of a crystal tube, and the inside of the crystal tube is substituted with N2 . While a constant amount of N2 that flows in parallel on a substrate surface is being supplied, a substrate temperature is increased and the temperature is maintained. After that, the temperature of a substrate is cooled to a room temperature. The ratio of an acceptor concentration to the Mg impurity concentration in a GaN film is increased by approximately 1%, thus obtaining a stable and high activation rate. |
申请公布号 |
JPH10294490(A) |
申请公布日期 |
1998.11.04 |
申请号 |
JP19970100506 |
申请日期 |
1997.04.17 |
申请人 |
TOSHIBA ELECTRON ENG CORP;TOSHIBA CORP |
发明人 |
FURUKAWA CHISATO;ISHIKAWA MASAYUKI;SUGAWARA HIDETO;ISOMOTO KENJI |
分类号 |
H01L21/205;H01L33/06;H01L33/32;H01L33/36 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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