| 摘要 |
PROBLEM TO BE SOLVED: To improve performance of a shutter which uniformizes light exposure. SOLUTION: An X ray L1 , which is magnified in the direction of an axis Y by a cylindrical mirror 2, passes through a shutter 10 to expose a wafer on a wafer stage 4. The shutter 10 comprises a first shutter screen 11 having a lower edge 11a which serves as a preceding edge, and a second shutter screen 12 having an upper edge 12a which serves as a succeeding edge. The individual shutter screens 11 and 12 are linearly driven by linear motors 13 and 14, respectively. Comparing with the case using a belt or the like, the driving unit is simplified, with high reliability and responsiveness of speed control. |
