| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high-radiation glass subject coating material and a high- radiation glass film with a high-radiation pigment dispersed in the glass texture, capable of adequately controlling the interfacial reactions between the high- radiation pigment and glass texture, while it is manufactured and in service, and to provide a method for producing the glass film. SOLUTION: This coating material is in the form of glass paste containing silicon tetraboride 18 coated with a silica glass film (silica glass layer 20) of a specific thickness which contains silicon dioxide at a content higher than that in the glass texture 16 in the interface with the silicon tetraboride 18. As a result, a glass film 10, obtained by baking the paste spread over the surface 12 of a substrate 14, contains the silica glass film (silica glass layer 20 in the interface between the silicon tetraboride 18 and glass texture 16. This reduces reactivity between the silicon tetraboride 18 and glass texture 16, become of the presence of the silica glass film (silica glass layer 20) containing silicon dioxide at a content higher than that in the glass texture 16. |
