| 摘要 |
FIELD: light industry, in particular, production of pattern sets used for cutting materials and manufacture of clothings. SUBSTANCE: method involves providing patterns with stitch lines; connecting corresponding stitch lines to form seams, with fitting margins allowing compensation of material elongation and unevenness being provided. Fitting margin coefficient is calculated as part of prospective main stitch line and is included into length value of auxiliary stitch lines which are to be connected to main stitch line for forming seam. Method further involves introducing pattern set data into computer. Patterns may be classified for different sizes of clothings. Seam margin coefficient may be computer controlled. EFFECT: increased efficiency, provision for producing high-precision patterns and, as a result, high-quality pieces of clothing. 20 cl, 4 dwg
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