| 摘要 |
A projection exposure apparatus includes an illumination system (3) for illuminating a pattern of an original (1), a holder (12) for holding a substrate (2), a projection optical system (4,7) for projecting an image of the pattern of the original onto the substrate held by the holding means, the projection optical system including a plane optical element (7) spaced from the main part (4) of the projection optical system and being disposed to be opposed to the surface of the substrate, and a casing (9) effective to fill the interspace between the optical element and the substrate opposed to each other, wherein the optical element provides an upper cover of the casing. <IMAGE> <IMAGE> |
