| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing equipment wherein the degradation in pattern precision at exposure due to contamination on the rear surface of substrate is prevented by washing the rear surface of substrate before it is transported into an aligner. SOLUTION: Relating to a substrate processing equipment, its first layer part is provided with an indexer part 2, a pair of spin-coater 4, a pair of spin- developer 5, a washing unit 6, an inversion unit 7, and an interface part 3, and the second layer part allocated above the first layer part is provided with twelve thermal processing units 9 allocated in multistage. At the center part of the substrate processing equipment a substrate transportation mechanism 1 which transports a substrate over the first and second layer parts is allocated. The substrate is inverted by the inversion unit 7 before it is transported from the interface part 3 to a stepper, for washing of the rear surface by the washing unit 6. |
