Method of developing positive photoresist and compositions therefor
摘要
A method and composition for developing positive photoresists is illustrated. The developer of the present invention includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties.
申请公布号
US5821036(A)
申请公布日期
1998.10.13
申请号
US19970960105
申请日期
1997.10.27
申请人
CLARIANT FINANCE (BVI) LIMITED
发明人
FICNER, STANLEY A.;MAGVAS, JOHN;LYONS, CHRISTOPHER F.;MOREAU, WAYNE M.;PLAT, MARINA V.