发明名称 |
Carrier head with a layer of conformable material for a chemical mechanical polishing system |
摘要 |
A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing with a recess. A flexible membrane defines an enclosed volume in the recess. A conformable material is disposed in the enclosed volume. The conformable material ensures that any load applied to the substrate is evenly distributed.
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申请公布号 |
US5820448(A) |
申请公布日期 |
1998.10.13 |
申请号 |
US19960729298 |
申请日期 |
1996.10.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SHAMOUILIAN, SAM;SHENDON, NORM |
分类号 |
B24B29/00;B24B37/04;B24B49/16;H01L21/304;(IPC1-7):B24B5/00 |
主分类号 |
B24B29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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