发明名称 APPARATUS FOR FOCUSING
摘要 PROBLEM TO BE SOLVED: To obtain an apparatus for focusing of simple structure which can be adjusted relatively easily and can precisely focus even on a substrate surface with steps. SOLUTION: An apparatus for focusing including a focus sensor 5 irradiating a substrate 4 with sensor light, a focus detector 6 receiving the reflected light of the sensor light irradiated by the focus sensor 5, a focus calculation unit 7 detecting the height of thickness direction of the substrate 4 with the quantity of the reflected light of the sensor light received by the focus detector 6 and calculating the focal position is provided with one focus sensor 5, one focus detector 6, and even a means for scanning irradiation position scanning the irradiation position of the focus sensor 5 in the irradiated area in a grid pattern.
申请公布号 JPH10270335(A) 申请公布日期 1998.10.09
申请号 JP19970075649 申请日期 1997.03.27
申请人 SONY CORP 发明人 YABUTA MITSUO
分类号 G03F7/207;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/207
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