| 摘要 |
PROBLEM TO BE SOLVED: To surely wash a photomask used in the exposure stage of photolithographic work without requiring skill by rotating the photomask so that processing solution coming in contact with the photomask is removed, and drying it. SOLUTION: In the case of spraying the processing solution to the photomask 4, the photomask 4 is placed on a rotary table 3 and coated with the processing solution while it is slowly rotated. By rotating the photomask 4, the processing solution coming in contact with the photomask 4 is always new, and by rotating it slowly, the processing solution is hardly splashed to be mist spray. After the photomask 4 is washed with the processing solution, the photomask is rinsed with water. At such a time, it is rinsed from both upper and lower surfaces by using processing solution discharge nozzles 5 and 6. This is because the processing solution going round to the back due to the rinsing from the lower surface can be removed. By rotating the photomask 4 at high speed after rinsing, the water on the photomask 4 is shaken off so as to dry the photomask 4. |
