Pellicle assembly having a vented frame

摘要

A pellicle for isolating a photomask pattern from particulate contaminants. The pellicle includes a peripheral frame having at least one vent for the passage of a gaseous substance between the interior of the frame and the atmosphere outside of the frame. The vent is configured for removal of particulate contaminants from the gaseous substance before the gaseous substance flows into the interior of the frame. The vent includes a recess formed in a first edge of the frame and at least two inlets opening into the recess, one of which couples the recess to the interior cavity of the pellicle and the other of which couples the recess to the atmosphere outside of the frame. At least one inlet is located in the first edge of the frame.